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1、近4年影响因子:中科院杂志分区 工程：综合分类下的 2 区期刊2013年度 2012年度 2011年度 2010年度出版社或管理机构 杂志由 IOP P期刊名 nanotechnology 出版周期: 周刊UBLISHING LTD 出版或管理。

2、 ISSN号：0957-4484杂志/稿件收录要求 In response to the growth in research in the area and the extension of nanotechnology across traditional academic fields the journal will be changing its scope from January 2002. The new scope will strongl3.672 3.842 3.979 3.644y reflect the interdisciplinary aspect of nanoscale science and technology with the aim of becoming the primary source of rmation in this r expanding field. In the meantime we invite authors who work at the forefront of nanoscale science and technology, and especially those in interdisciplinary areas, to submit their s to the journal. Present subject coverage. Papers are expected to be original experimental or theoretical research or to be an original synthesis or ysis of subjects related to nanotechnology. Here, nanotechnology is taken to include all those technologies and enabling technologies associated with either the 'top-down' approach to fabricating miniature elements by sculpting the desired structure from a macroscopic piece of material, as well as the 'bottom-up' approach of building the desired structure atom by atom or molecule by molecule. Typical appropriate topics include, but are not limited to: engineering fabrication involving atomic ll machining and metrology involving dimension, size and tolerances less than the welength of light and down to values of at largest 0.2 nm, but preferably to x-ray lls and beyond; performance of micromechanis such as microactuators to subnanometre and molecular lls; the design of instruments and machine tools capable of measuring, performing and manufacturing to nanometre lls; the application of nanometre ll instruments such as scanning tunnelling microscopes and atomic force microscopes to biology, medicine and materials science; miniaturization of electronic, mechanical and optical components, and their fabrication with such mods as ion-beam removal and deition, molecular-beam epitaxy and electron-beam and photon-beam lithography; fabrication and use of field-emission vacuum microelectronic devs; nanoelectronics including nanometre scale semiconductor structures and their potential electronic dev applications; molecular engineering--either molecular scale components or new molecular materials exhibiting unique electronic, mechanical or optical properties; nanoprecision instrumentation, e.g., x-ray multilayer thin-film fabrication and associated suce processing.。

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